DuPont’s roots run deep in its production-proven line of ancillary lithography products. From organic and inorganic developers to a full suite of removers, strippers, and edge-bead solvents and cleaning products, our formulations stand the test of time and provide customers with a complete solution across the spectrum of lithography processes.
DuPont’s global manufacturing and support footprint make these low-cost solutions easily accessible.
Our developers are designed to be application-specific and to suit customer preferences. Choose from our metal-ion bearing, organic and metal ion-free inorganic developers that come in a variety of formulations including:
Filtered and processed to ensure the highest purity solvents, our removers and strippers create clean lines prior to photoresist deposition. This results in low defects, even at advanced technology nodes.
DuPont offers a complete line of supporting chemistries formulated as companions to our photoresists, to cover multiple facets for different processing conditions. These include:
DuPont’s roots run deep in its production-proven line of ancillary lithography products. From developers, removers, and other enhancement chemistries, we support a total lithography solution.
Used in conjunction with photoresists, DuPont’s advanced overcoat materials are designed to prevent defects and improve the lithography process window, enabling finer feature patterns.View Details
Anti-reflective coatings and sublayers boost the effectiveness of lithography by widening and improving the process and reflectivity windows.View Details
An organic, thermally cross-linking BARC for 248 nm photoresists
An organic bottom anti-reflectant coating (oBARC) for immersion lithography
An organic gap filling material for extremely narrow trenches
An organic, thermally cross-linking bottom anti-reflectant for 248 nm (KrF) photoresist
A family of cross-linkable BARCs that can etch 30% faster than photoresists
DuPont’s robust, production-proven photoresist product line offers materials options that meet the requirements across generations of lithography processes.View Details
Positive tone ArF (193 nm) dry photoresists optimized for trench and line/space applications
Positive tone 193 nm immersion resists with an excellent process window, CD uniformity and low defectivity
Positive tone 193 nm implant resists with good profile through pitch and excellent substrate compatibility
DUV and 193nm photoresist performance begins with the polymer, and DuPont electronic grade polymers continue to improve upon existing techniques for polymer manufacture, isolation, and evaluation.View Details
We offer services such as defect testing or patterning wafersView Details