Dow’s Peter Trefonas, Ph.D., to Be Honored with SCI Perkin Medal

June 28,2016
Dow’s Peter Trefonas, Ph.D.

Named for its first recipient, Sir William Perkin, for his discovery of synthetic dye in 1856, The Society of Chemical Industry (SCI) Perkin Medal is recognized as the highest honor given for outstanding work in applied chemistry in the United States. Since it was first given to Perkin in a ceremony in 1906, the award has been presented to more than 100 notable scientists. Dow’s Peter Trefonas, Ph.D., will join this prestigious group of scientists when he is presented with the Perkin Medal at a dinner in his honor on September 13, 2016.

Trefonas is a corporate fellow in Electronic Materials at The Dow Chemical Company. His expertise is in the chemicals and materials used in photolithography. The Perkin Medal recognizes his work in creating materials that have enabled production of smaller feature sizes in semiconductor manufacturing. Smaller features require shorter wavelengths, creating seemingly insurmountable problems, such as reflective scattering limiting resolution. His work combines creative chemistry with the underlying physics of semiconductor manufacturing to make smaller and smaller circuits possible. The photoresist chemistry and anti-reflective coatings he developed are critically important enablers of Moore's Law. Trefonas’ discoveries have enabled Dow to introduce many advanced solutions for lithographic processes, such as Dow AR™ antireflectant coatings.

Trefonas cites his pioneering work on photoresists, including commercialization of the first safer solvent ethyl-lactate-based resists and high-volume i-line resists, as well as the commercialization of antireflective coatings as his most significant career achievements. More recently, he’s been involved in several new developments in materials science and display technologies, and he provides valued mentorship throughout Dow’s R&D organization.

Read the Press Release

Dow’s Peter Trefonas, Ph.D.

Named for its first recipient, Sir William Perkin, for his discovery of synthetic dye in 1856, The Society of Chemical Industry (SCI) Perkin Medal is recognized as the highest honor given for outstanding work in applied chemistry in the United States. Since it was first given to Perkin in a ceremony in 1906, the award has been presented to more than 100 notable scientists. Dow’s Peter Trefonas, Ph.D., will join this prestigious group of scientists when he is presented with the Perkin Medal at a dinner in his honor on September 13, 2016.

Trefonas is a corporate fellow in Electronic Materials at The Dow Chemical Company. His expertise is in the chemicals and materials used in photolithography. The Perkin Medal recognizes his work in creating materials that have enabled production of smaller feature sizes in semiconductor manufacturing. Smaller features require shorter wavelengths, creating seemingly insurmountable problems, such as reflective scattering limiting resolution. His work combines creative chemistry with the underlying physics of semiconductor manufacturing to make smaller and smaller circuits possible. The photoresist chemistry and anti-reflective coatings he developed are critically important enablers of Moore's Law. Trefonas’ discoveries have enabled Dow to introduce many advanced solutions for lithographic processes, such as Dow AR™ antireflectant coatings.

Trefonas cites his pioneering work on photoresists, including commercialization of the first safer solvent ethyl-lactate-based resists and high-volume i-line resists, as well as the commercialization of antireflective coatings as his most significant career achievements. More recently, he’s been involved in several new developments in materials science and display technologies, and he provides valued mentorship throughout Dow’s R&D organization.

Read the Press Release