EKC Photoresist & Residue Removers

Photoresist and Post-Etch Residue Removal Chemistries for Semiconductor Fabrication

EKC Technology is a leading manufacturer of specialty chemicals used in the removal of photoresist post-dry etch process residue and chemical mechanical polishing defectivity.

Our products provide best in class process solutions for wafer cleaning, surface preparations, liquid and dry film resist removal, post CMP cleaning, selective etching and post-etch residue removal, enabling higher productivity, finer lines and improved yields.