EKC Photoresist & Residue Removers

DUPONT PRODUCTS & SERVICES

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Post Clean Treatments

Post Clean Treatments

Post clean treatments are specifically formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step.

Post-CMP Cleaners

Post-CMP Cleaners

Aqueous formulations employed for post-CMP cleaning are designed to protect the planarized metals and dielectrics preventing metal corrosion while providing a smooth defect free wafer surface.

Post-Etch Residue Removers

Post-Etch Residue Removers

Aqueous & Semi-aqueous organic mixtures formulated to effectively remove residues from substrate surfaces after via, poly and metal etch processes.

Removers for LED Fabrication

Removers for LED Fabrication

Enable removal of positive- and negative-tone photoresists as well as plasma-hardened residues, and which are compatible with a wide variety of metals required to form LED contacts.

WLP Photoresist Removers & TSV Cleaners

WLP Photoresist Removers & TSV Cleaners

Formulations optimized to effectively remove thick and thin resists used for TSV masks and wafer bumping by solder electroplating or stencil printing.

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