WLP Photoresist Removers & TSV Cleaners

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Photoresist Removers

Photoresist Removers

Organic materials specifically formulated to remove positive & negative photoresist from substrate surfaces.

Post Clean Treatments

Post Clean Treatments

Post clean treatments are specifically formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step.

Post-CMP Cleaners

Post-CMP Cleaners

Aqueous formulations employed for post-CMP cleaning are designed to protect the planarized metals and dielectrics preventing metal corrosion while providing a smooth defect free wafer surface.

Post-Etch Residue Removers

Post-Etch Residue Removers

Aqueous & Semi-aqueous organic mixtures formulated to effectively remove residues from substrate surfaces after via, poly and metal etch processes.

Removers for LED Fabrication

Removers for LED Fabrication

Enable removal of positive- and negative-tone photoresists as well as plasma-hardened residues, and which are compatible with a wide variety of metals required to form LED contacts.

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