Anti-Reflectants & Functional Sublayers

AR™ 137 Organic Bottom Anti-Reflectant Coating

AR™ 137 Organic Bottom Anti-Reflectant Coating

AR™ 137 is an organic bottom anti-reflectant coating (oBARC) for immersion lithography. It is designed to provide excellent optical parameters to minimize reflection through angles for hyper numerical aperture (NA) immersion exposure. AR™ 137’s fast etch rate improves pattern transfer by reducing resist loss during the etch process.

Features

  • Optimal n&k values for hyper NA exposure
  • High etch rate
  • Good compatibility with resist
  • Excellent coating property
  • Good EBR/RRC solvent compatibiliy

Benefits

  • Improves critical dimension uniformity (CDU)
  • Improves lithographic process margins
  • Improves etch process margins

     

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Figure 1: Reflectivity Curve at High NA (NA=1.35)

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Figure 2: Wide Process Margin and Good LWR at 39nm 1:1 L/S

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Figure 3: Low Sublimation

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AR™ 46

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AR™ 137

  Figure 4: Conformal Coating and Excellent Step Coverage