ArF Implant Resists

 
 
 

ArF Implant Resists 

DuPont's positive tone 193 nm (ArF) implant photoresists have a good profile through pitch and excellent substrate compatibility.

Features

  • 130 nm 1:2 trench
  • 130 nm ISO trench
  • 130 nm 1:2 line and space
  • 130 nm ISO line

Benefits

  • Improved bright to dark field bias
  • Excellent process window performance
  • Good profile through pitch
  • Excellent substrate compatibility
 
 
 

130 nm 1:2 Trench

130 nm ISO Trench

 
 
 

130 nm 1:2 L/S

130 nm ISO Line

 
 
 

Figure 1: 150 nm, 120 °C/30S HMDS, Annular 0.75NA, 0.5/0.25, SB/PEB=100°C/120°C

 
 
 
 
 
 

We’re here to help.

We love to talk about how our electronics solutions can build business, commercialize products,
and solve the challenges of our time.

 
 
 
-