IC1000™ CMP pad

IC1000™ CMP pad

The IC1000™ series of pads for chemical mechanical planarization (CMP) is the industry standard. DuPont’s IC1000™ pads are used in a wide variety of CMP applications today. While the IC1000™ formulation has remained constant, the quality and consistency of the product offerings have been improved continuously for over 20 years. Popular pads in this family include the IC1000™ CMP pad, the IC1010™ CMP pad and the IC1020™ CMP pad. 

Applications
  • Copper bulk, tungsten, STI/Ceria, oxide, buff
Solutions
  • CMP Pads
 
 
 

Features & benefits

  • Industry- standard hard pad for multiple applications
  • World-class quality and performance consistency
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    Technical Resources
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    Safety Data Sheets(All Languages)
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    Other CMP Applications

    Our CMP pads cover a wide range of applications and technology nodes. To further explore Dupont CMP pads, see our overview of the product families by application

     
     
     
     
     
     
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