Product Category: Topcoat
Dow Topcoat is designed for 193 nm immersion lithography. It is designed for use in single patterning and advanced patterning technologies at the 45 nm node and below. The high receding contact angle is designed specifically for next generation immersion scanners.
Figure 1: Dow ArF Immersion Resist on Dow Dual BARC, SB 120°C/50 sec Dow Topcoat, 90C/60s, PEB 95°C/50sec, 42 nm/84 nm pitch lines