Optivision™ CMP Pads

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Optivision™ CMP Pads

The Optivision™ pad series for chemical mechanical planarization (CMP) is DuPont’s second generation soft pad that improves on the performance of Politex™ pads and is designed for improvements in cost of ownership.

 
 
 

Features & benefits

  • Available on multiple substrates
  • Improved lifetime compared to Politex™ pads
  • Improved removal rate and defectivity compared to Politex™ polishing pads
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    Technical Resources
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    Safety Data Sheets(All Languages)
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    Other CMP Applications

    Our CMP pads cover a wide range of applications and technology nodes. To further explore Dupont CMP pads, see our overview of the product families by application

     
     
     
     
     
     
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