LED CMP Pads and Slurries

Dow Electronic Materials is the clear leader in developing consumables for chemical mechanical polishing (CMP) and our technology has been instrumental in rapidly advancing semiconductor performance. CMP pads and slurries are also essential to LED manufacturing, and offerings such as our POLITEX™ and SUBA™ pad families are ideal for LED substrate generation.

Dow’s LED CMP products meet all critical performance criteria:

  • Fast removal rates
  • Low defectivity
  • Ultra-low surface roughness
  • Optimal wear rates
  • Single-component, ready-to-use slurries
  • Excellent stability and shelf life

Our semiconductor-grade CMP products deliver the advanced performance needed to polish LED substrates to the exacting specifications of state-of-the-art high-brightness LEDs.