Post Clean Treatments

Post Clean Treatments

Post clean treatments are specifically formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step.

EKC4000™ PCT
EKC4000™ PCT is a cost effective replacement that outperforms conventional "rinse" chemistries such as IPA and NMP. It quickly and effectively eliminates corrosion on the wafer surface caused by drag-out (carry over) of chemistry from prior wet cleaning. EKC4000™ PCT is compatible with automatic equipment and is formulated to meet ULSI grade specifications for advanced wafer treatment. 

  

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