AR™ 10L Bottom Anti-Reflectant Coating

AR™ 10L Bottom Anti-Reflectant Coating

AR™ 10L is an organic, thermally cross-linking bottom anti-reflectant coating (BARC) for 248 nm (KrF) photoresists. It is designed to provide a universal anti-reflective surface for high- and low-temperature resist platforms and offers excellent compatibility with most ESCAP HYBRID and Acetal resists.

Solutions
  • Anti-Reflectants & Functional Sublayers
 
 
 

Features & benefits

  • 1st min film thickness=600A over reflective dielectrics
  • Approximate optical density=9abs/um
  • Compatible with common spin-coating and EBR solvents
  • Conformal coating
  • Fast etching rate, typically 30-40% faster than DUV series photoresists
  • Universal resist compatibility
  • 1st min film thickness=600A over reflective dielectrics
  • Approximate optical density=9abs/um
  • Compatible with common spin-coating and EBR solvents
  • Conformal coating
  • Fast etching rate, typically 30-40% faster than DUV series photoresists
  • Universal resist compatibility
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    Available Sizes

    Gross Weight Net Weight Carton Each Carton Length Carton Weight Carton Height
    757 0 0 0
     
     
     
     
     
     
    Product Details

    Fabric/material

    ARCS

    Design

    AR 10L-400 DUV

    Seam

    AR™ 10L-400 DUV ANTI-REFLECTANT

    Packaging

    ARCS

    Hazard

    Coated Material

    ARCS

    Features

    ARCS

     
     
     
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    Safety Data Sheets(All Languages)
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