Product Category: Below Resists: oBARC-KrF Implant BARC
AR™ 254 is an organic, thermally cross-linking bottom anti-reflectant for 248 nm (KrF) photoresist. It has excellent gap filling and planarizing properties that are key requirements for advanced semiconductor devices having FinFET structures. AR 254 has a high etch rate to reduce substrate damage and optimal optical parameters to minimize reflectance.
+0.05um Best focus
Figure 3: Excellent Resist Profile on AR™ 254