The Lavoisier Medal for Lifetime Technical Achievement is the company’s highest science award and recognizes scientists and engineers who have demonstrated a career of creative technical contributions with significant business impact. The medal is named in honor of the 18th century French chemist, Antoine Laurent Lavoisier, who is considered the father of modern chemistry.
Senior Research Laureate
DuPont Electronics & Industrial, Emerging Technologies; Marlborough, MA
Deyan is an outstanding scientist and technical leader for the electronic materials community. Across his 30-year industrial career, he’s been a lifetime achiever in creating pathfinding technology for business success, including three revolutionary and highly profitable technology platforms: (1) embedded barrier layer and (2) immersion topcoat for 193 nm immersion lithography, and (3) novel leveler materials for plated copper interconnects. These inventions have driven new processes with customers and industries and have made DuPont a leader in materials for semiconductor and circuit board manufacturing.
The Pedersen Award recipients are selected by the DuPont Fellows, a group of the highest technical professionals in the company. The recipients’ technical knowledge, skill and commitment in their respective areas have resulted in important new products for DuPont customers. The award is named in honor of Charles J. Pedersen, who received the 1987 Nobel Prize for his discovery of a novel class of chemical compounds called macrocyclic polyethers, which he dubbed the “crown” ethers because of their molecular shape.
DuPont Electronics & Industrial, Semiconductor Technologies – Advanced Cleans Technologies; Hayward, CA
Paul led the Advanced Cleans Technologies (ACT) post-Chemical Mechanical Planarization (CMP) cleans development group that designed key formulations which became the highly successful 5600 copper post-CMP cleans series. Most notable was Paul’s invention of PCMPSolv™ 5615 and PCMPSolv™ 5640, which contain the critical components used in DuPont’s copper post-CMP cleans which is an industry standard for advanced device nodes ≤14 nm. Additionally, Paul’s development of the foundational understanding of key residue removal mechanisms led to the cleaning efficiency equation which identifies the critical factors that determine product performance.
DuPont Water & Protection, Water Solutions; Edina, MN
Jon is the lead technical expert for the design of reverse osmosis (RO) and nanofiltration spiral wound elements and the components that comprise them. For over two decades, he has led efforts to link fundamental engineering principles to element limitations and capabilities, which has materialized in value-added products for our customers. This includes novel module design technology that enabled the award-winning Fortilife™ CR100 and related family of products, as well as the iLEC™ Interlocking Endcap, which has been used in over two million FilmTec™ membrane modules since its introduction in 2005.