DuPont's positive tone 193 nm (ArF) implant photoresists have a good profile through pitch and excellent substrate compatibility.
Features
Benefits
130 nm 1:2 Trench
130 nm ISO Trench
130 nm 1:2 L/S
130 nm ISO Line
Figure 1: 150 nm, 120 °C/30S HMDS, Annular 0.75NA, 0.5/0.25, SB/PEB=100°C/120°C
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