As the surface roughness of dielectric materials continues to reduce to meet the needs of next generation finer width and space patterns, it becomes more difficult to deliver uniform roughening of the low profile surface.
Circuposit™ 7800 Desmear process is an easy to control 3-step process, specially formulated to apply to newer generations of dielectric materials to improve the adhesion of the subsequent metal layer.
Key Benefits:
Surface Morphology
GXT31
SiO2 content: 63wt%
Ra: 0.3-0.4um
GXT62
SiO2 content: 50wt%
Ra: 0.1-0.2um
GL102
SiO2 content: 72wt%
Ra: 0.1-0.2um
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