AR™ 137 is an organic bottom anti-reflectant coating (oBARC) for immersion lithography. It is designed to provide excellent optical parameters to minimize reflection through angles for hyper numerical aperture (NA) immersion exposure. AR™ 137’s fast etch rate improves pattern transfer by reducing resist loss during the etch process.
Figure 1: Reflectivity Curve at High NA (NA=1.35)
Figure 2: Wide Process Margin and Good LWR at 39nm 1:1 L/S
Figure 3: Low Sublimation
Figure 4: Conformal Coating and Excellent Step Coverage