AR™ 201 is an organic gap filling material. It can fill extremely narrow trench without voids and provides an excellent solution for advanced devices with FinFET structures. AR™ 201 can also work as an anti-reflectant and reduce reflectivity for KrF and ArF processes.
Figure 1: Gap Fill at High Aspect Ratio Topography: Aspect Ratio=10
Figure 2: Excellent Gap Fill and Planarization
Figure 3: AR™ 201 Lithographic Performance at 200 nm 1:1 L/S