AR™ 137 Organic Bottom Anti-Reflectant Coating

AR™ 137 Organic Bottom Anti-Reflectant Coating

AR™ 137 is an organic bottom anti-reflectant coating (oBARC) for immersion lithography. It is designed to provide excellent optical parameters to minimize reflection through angles for hyper numerical aperture (NA) immersion exposure.

Solutions
  • Anti-Reflectants & Functional Sublayers
 
 
 

Features & benefits

  • Excellent coating property
  • Good EBR/RRC solvent compatibiliy
  • Good compatibility with resist
  • High etch rate
  • Improves critical dimension uniformity (CDU)
  • Improves etch process margin
  • Improves lithographic process margins
  • Optimal n&k values for hyper NA exposure
  • Excellent coating property
  • Good EBR/RRC solvent compatibiliy
  • Good compatibility with resist
  • High etch rate
  • Improves critical dimension uniformity (CDU)
  • Improves etch process margin
  • Improves lithographic process margins
  • Optimal n&k values for hyper NA exposure
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    Available Sizes

    Gross Weight Net Weight Carton Each Carton Length Carton Weight Carton Height
    757 0 0 0
     
     
     
     
     
     
    Product Details

    Fabric/material

    ARCS

    Design

    AR137-230

    Seam

    AR137-230 193nm POSITIVE PHOTORESIST

    Packaging

    ARCS

    Hazard

    Coated Material

    ARCS

    Features

    ARCS

     
     
     
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