AR™ 19G2-612 193nm ANTI REFLECTANT

DuPont’s AR™ Fast Etch Organic BARCs are based on polymers that contain a chromophore to reduce substrate reflectivity and include oxygen-rich monomers that etch quickly during the pattern transfer step. The fast etch properties of these products and the easy removal without significant loss of the resist film thickness are key to making advanced integrated circuits.