AR™ 254 is an organic, thermally cross-linking bottom anti-reflectant for 248 nm (KrF) photoresist. It has excellent gap filling and planarizing properties that are key requirements for advanced semiconductor devices having FinFET structures. AR™ 254 has a high etch rate to reduce substrate damage and optimal optical parameters to minimize reflectance.
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| Gross Weight | Net Weight | Carton Each | Carton Length | Carton Weight | Carton Height |
|---|---|---|---|---|---|
| 757 | 0 | 0 | 0 | ||
| 757 | 0 | 0 | 0 | ||
| 757 | 0 | 0 | 0 |
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Fabric/material |
ARCS |
|---|---|
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Design |
AR254-1000 DUV |
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Seam |
AR254-1000 DUV ANTI-REFLECTANT |
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Packaging |
ARCS |
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Hazard |
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Coated Material |
ARCS |
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Features |
ARCS |