Optiplane™ Slurries

Optiplane™ Slurries

The Optiplane™ slurry platform is a family of advanced dielectric, nitride and polysilicon slurries with tunable removal rates and selectivities that can meet defect reduction requirements and tighter specifications at a competitive cost for manufacturing the next generation of advanced semiconductor devices.

 
 
 

Features & benefits

  • Slurries are designed to enable the planarization and material removal such that surface quality and material property integrity is maintained or improved.
  • Slurries are made up of a combination of key additives which enable precise polishing of the wafer surface. 
  • State-of-the-art polishing slurries enable topography or flatness to be maintained at or less than 300 angstroms across a 300mm wafer.
  • Surface finish of materials, including corrosion sensitive metals, is maintained at the single-digit angstrom level.
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