Dry Film Photoresist

Riston® DI3000 Dry Film Photoresist

The advanced fine line direct imaging photoresist solution for IC substrate application

 
 
 

Riston® DI3000 Dry Film Photoresist

Next Generation T/E and P/E direct imaging photoresist.

Features:

  • Superior tenting capability 
  • Excellent chemical resistance with no ragged line 
  • Wide operation window by fine line capability 
  • Capable with i-line & h-line multiple wavelength DI equipment 
  • Low sludge/foaming for easy maintenance 
 
 
 
DI3000