SPIE Advanced Lithography + Patterning
February 25 – February 29
San Jose, California
DuPont is proud to sponsor SPIE Advanced Lithography + Patterning 2024. Join us at our technical presentations to learn from our experts on the latest developments in advanced lithography and EUV.
February 26
Advanced chemically amplified EUV resist design strategies to reduce the etch related defectivity
4:20 pm - 4:40 pm PST | Convention Center, Grand Ballroom 220C | Paper 12957-9
February 28
5:30 pm - 7:00 pm PST | Convention Center, Hall 2 | Paper 12957-71
Demonstration and Optimization of Non-PFAs Photoresist for Various Applications
5:30 pm – 7:00 pm PST | Convention Center, Hall 2 | Paper 12957-113
Impact of EUV absorption increase of CAR polymers on lithographic performance
5:30 pm - 7:00 pm PST | Convention Center, Hall 2 | Paper 12957-72
Identifying Trends in Resist Polymer Properties to Improve Line & Space Defects
5:30 pm – 7:00 pm PST | Convention Center, Hall 2 | Paper 12957-64
Non-PFAs Photoacid Generator Development Using Computational Chemistry and Library Design
5:30 pm – 7:00 pm PST | Convention Center, Hall 2 | Paper 12957-112
Novel spin-on overcoat materials for EUV photoresist enhancement
2:20 pm – 2:40 pm PST | Convention Center, Grand Ballroom 220C | Paper 12957-38
Safer and Sustainable by Design: Strategies Toward PFAs Reduction in Photolithography Materials
5:30 pm – 7:00 pm PST | Convention Center, Hall 2 | Paper 12957-111
February 29
Acid generation efficiency prediction by bond cleavage calculation of EUV photoacid generators
11:10 am - 11:30 am PST | Convention Center, Grand Ballroom 220C | Paper 12957-46
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To learn more about the DuPont lithography materials that supports advanced patterning, please visit us here.
For more information about SPIE, please visit the website.
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