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EKC Photoresist & Residue Removers
Photoresist and Post-Etch Residue Removal Chemistries for Semiconductor Fabrication
DuPont is a leading manufacturer of specialty chemicals used in the removal of photoresist post-dry etch process residue and chemical mechanical polishing (CMP) defectivity.
Our EKC Technology products provide best-in-class process solutions for wafer cleaning, surface preparations, liquid and dry film resist removal, post CMP cleaning, selective etching and post-etch residue removal. DuPont's specialized formulations allow you to achieve higher productivity and improved yields on designs with finer line width and spacing.
Photoresist & Residue Removers
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Post-Clean Treatments
Post-Clean Treatments
Post-Clean treatments are specifically formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step.
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Post-Etch Residue Removers
Post-Etch Residue Removers
Aqueous & semi-aqueous organic mixtures formulated to effectively remove residues from substrate surfaces after via, poly and metal etch processes.
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Post-CMP Cleaners
Post-CMP Cleaners
Aqueous formulations employed for post-CMP cleaning are designed to protect the planarized metals and dielectrics preventing metal corrosion while providing a smooth defect free wafer surface.
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Removers for LED Fabrication
Removers for LED Fabrication
Enable removal of positive- and negative-tone photoresists as well as plasma-hardened residues, and which are compatible with a wide variety of metals required to form LED contacts
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WLP Photoresist Removers & TSV Cleaners
WLP Photoresist Removers & TSV Cleaners
Formulations optimized to effectively remove thick and thin resists used for TSV masks and wafer bumping by solder electroplating or stencil printing
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Photoresist Removers
Photoresist Removers
Organic materials specifically formulated to remove positive & negative photoresist from substrate surfaces
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