Semiconductor Fabrication and Packaging Materials
EKC Photoresist & Residue Removers
Twitter
Linkedin
Email
EKC Photoresist & Residue Removers
Photoresist and Post-Etch Residue Removal Chemistries for Semiconductor Fabrication
DuPont is a leading manufacturer of specialty chemicals used in the removal of photoresist post-dry etch process residue and chemical mechanical polishing (CMP) defectivity.
Our EKC Technology products provide best-in-class process solutions for wafer cleaning, surface preparations, liquid and dry film resist removal, post CMP cleaning, selective etching and post-etch residue removal. DuPont's specialized formulations allow you to achieve higher productivity and improved yields on designs with finer line width and spacing.
Photoresist & Residue Removers
- Post-Clean Treatments
- Post-Etch Residue Removers
- Post-CMP Cleaners
- Removers for LED Fabrication
- WLP Photoresist Removers & TSV Cleaners
- Photoresist Removers
Post-Clean Treatments
Post-Clean treatments are specifically formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step.
View DetailsPost-Etch Residue Removers
Aqueous & semi-aqueous organic mixtures formulated to effectively remove residues from substrate surfaces after via, poly and metal etch processes.
View DetailsPost-CMP Cleaners
Aqueous formulations employed for post-CMP cleaning are designed to protect the planarized metals and dielectrics preventing metal corrosion while providing a smooth defect free wafer surface.
View DetailsRemovers for LED Fabrication
Enable removal of positive- and negative-tone photoresists as well as plasma-hardened residues, and which are compatible with a wide variety of metals required to form LED contacts
View DetailsWLP Photoresist Removers & TSV Cleaners
Formulations optimized to effectively remove thick and thin resists used for TSV masks and wafer bumping by solder electroplating or stencil printing
View DetailsPhotoresist Removers
Organic materials specifically formulated to remove positive & negative photoresist from substrate surfaces
View Details