Semiconductor Fabrication and Packaging Materials

EKC Photoresist & Residue Removers


EKC Photoresist & Residue Removers

Photoresist and Post-Etch Residue Removal Chemistries for Semiconductor Fabrication

DuPont is a leading manufacturer of specialty chemicals used in the removal of photoresist post-dry etch process residue and chemical mechanical polishing (CMP) defectivity.

Our EKC Technology products provide best-in-class process solutions for wafer cleaning, surface preparations, liquid and dry film resist removal, post CMP cleaning, selective etching and post-etch residue removal. DuPont's specialized formulations allow you to achieve higher productivity and improved yields on designs with finer line width and spacing.

Photoresist & Residue Removers

  • Post-Clean Treatments

    Post-Clean Treatments

    Post-Clean treatments are specifically formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step.

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  • Post-Etch Residue Removers

    Post-Etch Residue Removers

    Aqueous & semi-aqueous organic mixtures formulated to effectively remove residues from substrate surfaces after via, poly and metal etch processes.

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  • Post-CMP Cleaners

    Post-CMP Cleaners

    Aqueous formulations employed for post-CMP cleaning are designed to protect the planarized metals and dielectrics preventing metal corrosion while providing a smooth defect free wafer surface.

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  • Removers for LED Fabrication

    Removers for LED Fabrication

    Enable removal of positive- and negative-tone photoresists as well as plasma-hardened residues, and which are compatible with a wide variety of metals required to form LED contacts

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  • WLP Photoresist Removers & TSV Cleaners

    WLP Photoresist Removers & TSV Cleaners

    Formulations optimized to effectively remove thick and thin resists used for TSV masks and wafer bumping by solder electroplating or stencil printing

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  • Photoresist Removers

    Photoresist Removers

    Organic materials specifically formulated to remove positive & negative photoresist from substrate surfaces

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