Semiconductor Silicone Materials

Si Precursors

Silicon Precursors

Silicon Precursors Help Optimize CVD and ALD

Silicon-containing materials are used throughout semiconductor device manufacturing. DuPont is a longtime provider of silicon gas/precursors for the chemical vapor deposition (CVD) and atomic layer deposition (ALD) steps in chipmaking.

These proven solutions have been widely adopted throughout the semiconductor industry, with DuPont delivering a safe, stable supply and quality management of these advanced materials.

DuPont’s offerings include:

  • Trimethysilane (3MS) gas for low-K dielectric and low-K diffusion barriers with copper interconnects, as well as etch hard masks

  • Tetramethylsilane (4MS) precursors for low-K barrier films; etch hard masks; and carbon-doped silicon films and silicon carbide-like films

  • Hexachlorodisilane (HCDS) precursors for conformal silicon oxide and silicon nitride applications throughout the ALD process. Available in both chemical and electronic grade products.

  • DuPont – your partner for quality silicon-based precursor materials.

  • Silicon precursors are high-purity gas or liquid materials used in key steps during the manufacture of semiconductor devices.

     

Semiconductor Silicone Materials

  • Si Precursors
  • Spin-on dielectrics

Si Precursors

Silicon precursors are high-purity gas or liquid materials used in key steps during the manufacture of semiconductor devices.

Spin-on dielectrics

Spin-on dielectric materials to make multilevel metal ICs more planar, reducing process complexity and cost.

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