Join us at our technical presentations to learn from our experts on the latest developments in advanced lithography, including extreme ultraviolet (EUV) lithography.
Monday, February 27
Modification of organic underlayers by plasma during dry etching and its effect on the film properties | Paper 12498-10
2:40 pm – 3:00 pm PST | Convention Center, Grand Ballroom 220C
Tuesday, February 28
Challenges and opportunities in material development and understanding that enables advanced photolithography | Paper 12498-15
11:20 am – 12:00 pm PST | Convention Center, Grand Ballroom 220C
Wednesday, March 1
Fundamental Studies of Interactions between Polymer Substrate and Precursor in Sequential Infiltration Synthesis | Paper 12498-28
8:50 am – 9:10 am PST | Convention Center, Grand Ballroom 220C
Presenter/Author: Andrew K. Whittaker, The University of Queensland; co-authored by DuPont Electronics & Industrial
Impact of EUV absorption increase of CAR polymers on lithographic performance | Paper 12498-70
5:30 pm – 7:00 pm PST | Convention Center, Hall 2
Spin speed impact on photoresist thin film properties and EUV lithographic performance | Paper 12498-69
5:30 pm – 7:00 pm PST | Convention Center, Hall 2
Considerations in the Design of Photoacid Generators | Paper 12498-68
5:30 pm – 7:00 pm PST | Convention Center, Hall 2
Copolymer solubility for 193nm photoresists: Fundamental studies for solution stability and defect reduction | Paper 12498-72
5:30 pm – 7:00 pm PST | Convention Center, Hall 2
A global leader in materials for semiconductor fabrication, packaging and assembly, DuPont offers a wide range of materials for lithography to improve existing processes and support advanced patterning. For technical or sales inquiries, please complete our contact form. If you’d like to connect with a DuPont representative in person at SPIE Advanced Lithography + Patterning, contact your account representative or contact us here.
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