Silicon-containing materials are used throughout semiconductor device manufacturing. DuPont is a longtime provider of silicon gas/precursors for the chemical vapor deposition (CVD) and atomic layer deposition (ALD) steps in chipmaking.
These proven solutions have been widely adopted throughout the semiconductor industry, with DuPont delivering a safe, stable supply and quality management of these advanced materials.
DuPont’s offerings include:
Trimethysilane (3MS) gas for low-K dielectric and low-K diffusion barriers with copper interconnects, as well as etch hard masks
Tetramethylsilane (4MS) precursors for low-K barrier films; etch hard masks; and carbon-doped silicon films and silicon carbide-like films
Hexachlorodisilane (HCDS) precursors for conformal silicon oxide and silicon nitride applications throughout the ALD process. Available in both chemical and electronic grade products.
DuPont – your partner for quality silicon-based precursor materials.
Silicon precursors are high-purity gas or liquid materials used in key steps during the manufacture of semiconductor devices.
Spin-on dielectric materials to make multilevel metal ICs more planar, reducing process complexity and cost.