English

IC1000™ CMP pad

IC1000™ CMP pad

The IC1000™ series of pads for chemical mechanical planarization (CMP) is the industry standard. DuPont’s IC1000™ pads are used in a wide variety of CMP applications today. While the IC1000™ formulation has remained constant, the quality and consistency of the product offerings have been improved continuously for over 20 years. Popular pads in this family include the IC1000™ CMP pad, the IC1010™ CMP pad and the IC1020™ CMP pad. 

Applications
  • Copper bulk, tungsten, STI/Ceria, oxide, buff
Solutions
  • CMP Pads
 
 
 

Features & benefits

  • Industry- standard hard pad for multiple applications
  • World-class quality and performance consistency
    		•
     
     
     
     
     
     
     
     
     
     
     
     
    Technical Resources
    View by:
    ✕
    ✕
    To access secured content from DuPont Please Sign In or Sign Up below
       
       
       
      Safety Data Sheets(All Languages)
      View by:
      ✕
      ✕
      To access secured content from DuPont Please Sign In or Sign Up below
         
         
         

        Other CMP Applications

        Our CMP pads cover a wide range of applications and technology nodes. To further explore Dupont CMP pads, see our overview of the product families by application

         
         
         
         
         
         
        -