Optivision™ CMP Pads

Optivision™ CMP Pads

The Optivision™ pad series for chemical mechanical planarization (CMP) is DuPont’s second generation soft pad that improves on the performance of Politex™ pads and is designed for improvements in cost of ownership.

 
 
 

Features & benefits

  • Available on multiple substrates
  • Improved lifetime compared to Politex™ pads
  • Improved removal rate and defectivity compared to Politex™ polishing pads
  •  
     
     
     
     
     
     
     
     
     
     
     
    Technical Resources
    View by:
    To access secured content from DuPont Please Sign In or Sign Up below
       
       
       
      Safety Data Sheets(All Languages)
      View by:
      To access secured content from DuPont Please Sign In or Sign Up below
         
         
         

        Other CMP Applications

        Our CMP pads cover a wide range of applications and technology nodes. To further explore Dupont CMP pads, see our overview of the product families by application

         
         
         
         
         
         
        -