Politex™ CMP Pads

Politex™ CMP Pads

The Politex™ pad series for chemical mechanical planarization (CMP) is used for copper barrier, buffing and cleaning applications. Politex™ pads are the industry-standard soft pad.

Applications
  • Copper barrier, buff
 
 
 

Features & benefits

  • Industry-standard soft pad for multiple applications
  • Requires no conditioning
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    Technical Resources
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    Safety Data Sheets(All Languages)
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    Other CMP Applications

    Our CMP pads cover a wide range of applications and technology nodes. To further explore Dupont CMP pads, see our overview of the product families by application

     
     
     
     
     
     
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