Politex™ CMP Pads

Politex™ CMP Pads

The Politex™ pad series for chemical mechanical planarization (CMP) is used for copper barrier, buffing and cleaning applications. Politex™ pads are the industry-standard soft pad.

Applications
  • Copper barrier, buff
 
 
 

Features & benefits

  • Industry-standard soft pad for multiple applications
  • Requires no conditioning
  •  
     
     
     
     
     
     
     
     
     
     
     
    Technical Resources
    View by:
    To access secured content from DuPont Please Sign In or Sign Up below
       
       
       
      Safety Data Sheets(All Languages)
      View by:
      To access secured content from DuPont Please Sign In or Sign Up below
         
         
         

        Other CMP Applications

        Our CMP pads cover a wide range of applications and technology nodes. To further explore Dupont CMP pads, see our overview of the product families by application

         
         
         
         
         
         
        -