DuPont Electronics & Imaging copper chemistries for redistribution layers (RDLs) are ideally suited to today’s high-density requirements, enabling RDL patterns for fan-out wafer level packages to meet next-generation line/space requirements down to 2 µm. Our easy-to-use, high-purity copper electroplating chemistries are formulated to enhance reliability of fine-line RDL and improve via-filling performance. They provide:
Copper RDL is an interconnect technology used in both fan-in and fan-out wafer level processing. It allows high-density I/Os to be redistributed for connection to the circuit board by increasing the pitch.
Additionally, the purity of the Cu formulation reduces manufacturing costs by eliminating the nickel barrier between the copper and solder elements required by other plating approaches to control topography and eliminate defects.
Driven by mobile applications that require increased functionality at lower power, RDL requirements are tightening from 5 µm line/space to 2 µm line/space. This calls for plating chemistries that can achieve high reliability with low-within-die uniformity.
The function of additives in RDL plating is similar to those in Cu pillar plating. DuPont’s INTERVIA 9000 plating chemistry can be used for both RDL and Cu pillar plating in one plating tool without changing the plating bath, making it an economical choice.
DuPont Electronics & Imaging copper chemistries for redistribution layers (RDLs) are ideally suited to today’s high-density requirements for wafer level packaging applications.
Our production-proven Cu pillar formulations work in perfect harmony with our under-bump metallization (UBM) and tin-silver capping chemistries, to provide a seamless solution for all your Cu pillar needs.View Details
DuPont’s award-winning Solderon™ BP electroplating chemistries are a reliable alternative to tin-lead alloys for all wafer bumping applications.View Details
Indium plating chemistry designed for low-temperature solder plating processes used in advanced wafer-level packaging for emerging applications that are sensitive to temperature.
HVM-proven tin-silver plating chemistry for lead-free, fine-pitch solder bump applications with industry-leading process versatility.
We offer a production-proven electroplating nickel chemistry tailored to meet a variety of UBM process needsView Details
DuPont offers positive- and negative-tone photoresists designed to meet the tight pitches and varied topographies of today’s semiconductor advanced packaging applications.View Details
Wafer-level packaging dry-film photoresist solutions for 3DIC, fan out, bumping, copper pillar and redistribution applications.
DuPont offers liquid bump plating photoresists, along with associated ancillaries, that are ideally suited for wafer-level packaging applications using single-spin coating.
Years of experience and success in electroplating damascene copper have helped DuPont bring leading-edge copper TSV chemistries to the advanced packaging market.View Details
Look to DuPont for packaging dielectric formulations that have the mechanical properties, high resolution, low-temp curing, easy processes, and superior reliability needed to protect your advanced WLP.View Details