Materials for Chemical Mechanical Planarization (CMP)

CMP Pads

CMP Pads

DuPont's Broad Portfolio of Polishing Pads

DuPont’s polishing pad portfolio sets the standard for chemical mechanical planarization (CMP) in semiconductor manufacturing. Our wide range of hard and soft CMP pads are designed to meet the distinct needs of each different CMP application and technology node.

Our technical team supports customers with a robust understanding of CMP fundamentals, including product and process development capabilities. We can talk to you about what CMP pad will best meet your particular needs, including advanced technical performance, yield improvements and cost-of-ownership. We also welcome the opportunity to help enhance your overall process.

DuPont's offerings include several product families, all of which can meet the needs of multiple applications.

  • Our CMP pads cover a wide range of applications and technology nodes. For help understanding which technologies are well-suited for different CMP applications, please refer to the following chart.

    Copper Bulk Polishing

    Ikonic™ 3040M, 4121H, 4250H
    Visionpad™ 6000, 7480, 9280
    IC1000™

    Copper Barrier Polishing

    Ikonic™ 2010H, 2020H, 2040H, 2060H
    Visionpad™ 3100, 3500
    Optivision™ PRO 9500

    Tungsten Polishing

    Ikonic™ 4250H, 4121H, 4141H
    Visionpad™ 5000
    IC1000™

    STI /Ceria Polishing Applications

    Ikonic™ 4121H, 4140H, 4250H
    Visionpad™ 5000, 6000
    IC1000™

    Oxide Polishing

    Visionpad™ 5000, 6000, 7480
    IC1000™

    Buff Polishing

    Ikonic™ 2010H, 2020H, 2040H, 2060H
    Optivision™ 4540, 4548
    Politex™, Politex™ AT
    IC1000™

     

Materials for CMP

  • CMP Pads
  • CMP Slurries

CMP Pads

Broad portfolio of CMP pads to meet the needs of any application.

IC1000™ CMP Polishing Pads

Setting the standard for performance in chemical mechanical planarization


Ikonic™ Polishing Pads

A breakthrough pad platform designed for advanced nodes


Optivision™ CMP Polishing Pads

Second-generation soft CMP pads designed for improvements in cost of ownership

Optivision™ PRO CMP Polishing Pads

Our newest soft CMP pad designed to facilitate advanced polishing


Politex™ CMP Polishing Pads

The industry standard soft pad for multiple CMP applications


Suba™ Polishing Pads

The industry standard CMP pad for silicon stock removal polishing


Visionpad™ Polishing Pads

Advanced CMP technology that suits multiple polishing applications


CMP Slurries

A range of offerings for chemical mechanical planarization (CMP) including Optiplane™, Acuplane™ and Klebosol® slurries.

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