DuPont’s complete line of anti-reflectant coatings and functional sublayer products include bottom anti-reflective coatings (BARCs), silicon anti-reflective coatings (SiARCs), and spin-on-carbons (SOCs). They are formulated to address advanced lithography challenges posed by the critical dimensions of today’s advanced technology nodes and 3D structures, improving throughput and enabling higher resolution to 20nm line pitches.
Anti-reflective coatings and sublayers – BARCs and SiARCs, and SOCs – are used to boost the effectiveness of lithography by widening and improving the process and reflectivity windows:
Anti-reflective coatings and sublayers boost the effectiveness of lithography by widening and improving the process and reflectivity windows.
An organic, thermally cross-linking BARC for 248 nm photoresists
An organic bottom anti-reflectant coating (oBARC) for immersion lithography
An organic gap filling material for extremely narrow trenches
An organic, thermally cross-linking bottom anti-reflectant for 248 nm (KrF) photoresist
A family of cross-linkable BARCs that can etch 30% faster than photoresists
Used in conjunction with photoresists, DuPont’s advanced overcoat materials are designed to prevent defects and improve the lithography process window, enabling finer feature patterns.View Details
DuPont’s robust, production-proven photoresist product line offers materials options that meet the requirements across generations of lithography processes.View Details
Positive tone ArF (193 nm) dry photoresists optimized for trench and line/space applications
Positive tone 193 nm immersion resists with an excellent process window, CD uniformity and low defectivity
Positive tone 193 nm implant resists with good profile through pitch and excellent substrate compatibility
DuPont’s roots run deep in its production-proven line of ancillary lithography products. From developers, removers, and other enhancement chemistries, we support a total lithography solution.View Details
DUV and 193nm photoresist performance begins with the polymer, and DuPont electronic grade polymers continue to improve upon existing techniques for polymer manufacture, isolation, and evaluation.View Details
We offer services such as defect testing or patterning wafersView Details