DuPont™ Riston® dry film photoresist revolutionized the way printed circuit boards were fabricated when it was invented by DuPont more than 40 years ago.
The original dry film photoresist invented by DuPont is the industry standard for high yield, productivity, and ease of use in all imaging applications. DuPont™ Riston® products meet the industry demands for finer features, higher quality and lower cost in all types of plating and etching applications.
Next Generation T/E and P/E direct imaging photoresist.
Used in tenting, plating, akaline etching or innerlayer applications.
The advanced fine line direct imaging photoresist solution for IC substrate application.
The advanced dry film photoresist for fine line HDI.
The advanced solution for fine line FPC design.
The advanced solution for tall copper pillar process in advanced packaging application.