The microelectronics market counts on water as a key raw material in the fabrication of devices such as semiconductors, photovoltaics, and flat panel displays. Ultrapure water (UPW) is the primary cleaning solvent used to rinse away remnants during the production process. Today’s integrated circuits are so complex that even the smallest contaminant can prevent a circuit from functioning properly.
For years, DuPont Water Solutions has been meeting the needs of original equipment manufacturers (OEMs) and customers in the semiconductor industry around the world. Our experience and range of solutions make us the perfect partner for the production of ultrapure water in microelectronics processing.
Our technologies provide industry-leading, long-lasting, and cost-effective solutions. Learn more about the technologies relevant to the microelectronics industry.
UF uses a membrane barrier to exclude colloids, bacteria, and more; for pretreatment in demineralization, industrial water production, drinking water production, or wastewater reuse.
RO is a pressure-driven separation process that reduces the smallest of solute particles and treats most ions and large molecules in the water.
IX uses polymeric resins capable of exchanging ions; applications include softening, bulk demineralization, trace contaminants removal, and condensate water polishing.
EDI is used as a polisher for boiler and ultrapure water makeup and can deliver the lowest conductivities, sodium, and silica in the product without chemical regeneration.